The influence of HIPiMS technology(high-power pulsed magnetron sputtering technology)on material properties is mainly reflected in the microstructure,density,mechanical properties,
In chemical vapor deposition (CVD) vacuum coating, the selection and ratio of reaction gases are like a pair of invisible but powerful hands, playing a decisive role in the composition and properties of the coating.
Higher density:High energy pulse PVD can generate high-density plasma during the deposition process,giving deposited particles higher energy and forming a denser film layer on the substrate.For example,in the preparation of hard coatings,
Such as titanium nitride(TiN)film layer.TiN has high hardness,good wear resistance,and chemical stability.TiN film layer prepared by high-energy pulse PVD technology is widely used in the field of tool coating
PVD is a technology that deposits a coating on the surface of a workpiece by evaporating a target material at high temperatures.High energy pulse PVD is an improved form of PVD technology,and its basic physical principles are as follows:
In the field of material preparation,HiPIMS(High Power Pulse Magnetron Sputtering)magnetron sputtering is gradually emerging as a new development trend.
HIPIMS(High Power Pulse Magnetron Sputtering)power supply can be used as a bias power supply under certain conditions,but there are also some limitations.
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