中国世俱杯官网入口
18922924269
EN
|
中文
Home
About Xinbo
中国世俱杯官网入口:Company profile
History
Culture
Technical service
中国世俱杯官网入口:Honor of qualification
中国世俱杯官网入口:HiPIMS Technology
HiPIMS principle
中国世俱杯官网入口:HiPIMS advantage
中国世俱杯官网入口:HiPIMS application
P3E Technology
中国世俱杯官网入口:High energy arc principle
High energy arc dominance
中国世俱杯官网入口:High energy arc application
中国世俱杯官网入口:PECVD Technology
中国世俱杯官网入口:PECVD technology technique
中国世俱杯官网入口:The pipeline coating
Product Center
中国世俱杯官网入口:Plasma Power Generators
HiPIMS power supply HiPIMS
中国世俱杯官网入口:P3E power supply
Bias power supply
中国世俱杯官网入口:Customized power supply
中国世俱杯官网入口:Coating Equipment
High power impulse magnetron sputtering coating eq
High power impulse cathodic arc ion sputtering coa
Magnetic control&multi arc composite PVD coating e
中国世俱杯官网入口:coating equipment for pipe inner wall
中国世俱杯官网入口:Vacuum plasma customized equipment
中国世俱杯官网入口:Solutions By Industry
Ceramic metallization solutions
中国世俱杯官网入口:Medical devices solutions
Tools with cutting edge solutions
Pipe inner wall solutions
中国世俱杯官网入口:Decorative coating solutions
Other solutions
News
Company News
中国世俱杯官网入口:Industry dynamics
中国世俱杯官网入口:Technical knowledge
中国世俱杯官网入口:Contact Us
Contact us
中国世俱杯官网入口:
Home
中国世俱杯官网入口:About Xinbo
中国世俱杯官网入口:Company profile
History
Culture
中国世俱杯官网入口:Technical service
中国世俱杯官网入口:Honor of qualification
中国世俱杯官网入口:HiPIMS Technology
HiPIMS principle
HiPIMS advantage
中国世俱杯官网入口:HiPIMS application
中国世俱杯官网入口:P3E Technology
中国世俱杯官网入口:HiPIMS principle
中国世俱杯官网入口:HiPIMS advantage
中国世俱杯官网入口:HiPIMS application
中国世俱杯官网入口:PECVD Technology
HiPIMS principle
中国世俱杯官网入口:HiPIMS advantage
中国世俱杯官网入口:HiPIMS application
中国世俱杯官网入口:Product Center
中国世俱杯官网入口:Plasma Power Generators
Coating Equipment
中国世俱杯官网入口:Solutions By Industry
News
Company News
Industry dynamics
Technical knowledge
Contact Us
中国世俱杯官网入口:Contact us
Language
English
中文
News Center
Technical knowledge
中国世俱杯官网入口:Company News
中国世俱杯官网入口:Industry dynamics
中国世俱杯官网入口:Technical knowledge
中国世俱杯官网入口:
HiPIMS tool New application - high entropy alloy film manufacturing
Learn more
Introduction of High-power Pulsed Magnetron Sputtering Technology (Part 2)
中国世俱杯官网入口:Learn more
High Power Pulsed Magnetron sputtering Technology (Part I)
High-power pulsed magnetron sputtering (HiPIMS), proposed by Kouznetsov1 et al.
中国世俱杯官网入口:Learn more
New application of HiPMS tool - high entropy alloy film manufacturing
High entropy alloy nitride film is a kind of product based on the design concept of high entropy alloy, which can have lower Gibbs free energy and lower element diffusion rate in thermodynamics and kinetics, respectively.
中国世俱杯官网入口:Learn more
Total: 20
First
Prev
1
2
3
Page:1
Page:2
Page:3
Learn more
HiPIMS tool New application - high entropy alloy film manufacturing
Learn more
Introduction of High-power Pulsed Magnetron Sputtering Technology (Part 2)
Learn more
High Power Pulsed Magnetron sputtering Technology (Part I)
Learn more
New application of HiPMS tool - high entropy alloy film manufacturing
Total: 20
First
Prev
1
2
3
Page:1
Page:2
Page:3
Latest news
What are the specific impacts of HIPiMS technology on material properties
How does the selection and ratio of reaction gases affect the composition and performance of vacuum coating?
What are the advantages of high-energy pulse PVD technology compared to traditional PVD?
What film layers can be prepared by high-energy pulse PVD technology?
What is the basic physical principle of high-energy pulse PVD?
中国世俱杯官网入口:What is the process flow of vacuum coating
HiPIMS Magnetron Sputtering: A New Trend in Material Preparation
Can HIPIMS power supply be used as a bias power supply
News recommendations
What are the specific impacts of HIPiMS technology on material properties
How does the selection and ratio of reaction gases affect the composition and performance of vacuum coating?
What are the advantages of high-energy pulse PVD technology compared to traditional PVD?
What film layers can be prepared by high-energy pulse PVD technology?
What is the basic physical principle of high-energy pulse PVD?
What is the process flow of vacuum coating
HiPIMS Magnetron Sputtering: A New Trend in Material Preparation
Can HIPIMS power supply be used as a bias power supply
keyword
var _hmt = _hmt || []; (function() { var hm = document.createElement("script"); hm.src = "https://hm.baidu.com/hm.js?4b3ee861d5af59f35934c3b5eef6acc3"; var s = document.getElementsByTagName("script")[0]; s.parentNode.insertBefore(hm, s); })();